Deposition potential dependence of composition, microstructure, and surface morphology of electrodeposited Ni-Cu alloy films
Journal of Materials Science: Materials in Electronics, vol.23, no.12, pp.2110-2116, 2012 (SCI-Expanded, Scopus)
- Publication Type: Article / Article
- Volume: 23 Issue: 12
- Publication Date: 2012
- Doi Number: 10.1007/s10854-012-0709-6
- Journal Name: Journal of Materials Science: Materials in Electronics
- Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
- Page Numbers: pp.2110-2116
- Anadolu University Affiliated: Yes
Abstract
Composition, microstructure, and surface morphology of Ni-Cu alloy films electrodeposited at different deposition potentials have been investigated. The microstructural analysis carried out by using X-ray diffraction (XRD) confirmed that all Ni-Cu films are polycrystalline in nature and possess face-centered cubic structure. XRD analysis also revealed that the (111) peak of the Ni-Cu alloy films splits into two as Cu-rich and Ni-rich peaks and the peak intensities change depending on the deposition potential and hence the film composition. Compositional analysis of Ni-Cu films carried out by energy dispersive X-ray spectroscopy showed that Ni content within the films increases as the deposition potential becomes more negative. The morphological analysis performed by using a scanning electron microscopy and an atomic force microscopy revealed that the surface morphology changes significantly with applied deposition potential. Furthermore, a direct correlation is observed between the surface roughness and lattice strain. © Springer Science+Business Media, LLC 2012.