The spray pyrolysis method for the deposition of thin solid films is a good method for the preparation of thin films suitable for scientific studies and for many applications in technology and industry. This method was used for the preparation of thin films of the important semiconductors II-VI. In this work, among these materials CdxZn1-xS films were deposited by spray pyrolysis method at 275 degrees C substrate temperature onto glass substrate at different deposition parameters. The structure of the films was analyzed by X-ray diffraction and the results obtained showed that the film structure polycrystalline structure. The effect of different deposition parameters on the band gap and optical constants (refractive index, extinction coefficient, and dielectric constants) of these films has been investigated and the deposition parameters change the optical constants and Urbach energy values of the films. The dispersion parameters such as E. (single-oscillator energy) and E-o (dispersive energy) of the deposited thin films were determined.