Effect of deposition temperature on the crystalline structure and surface morphology of ZnO films deposited on p-Si


European Conference of Chemical Engineering, ECCE'10, European Conference of Civil Engineering, ECCIE'10, European Conference of Mechanical Engineering, ECME'10, European Conference of Control, ECC'10, Puerto de la Cruz, Tenerife, Spain, 30 November - 02 December 2010, pp.227-231 identifier

  • Publication Type: Conference Paper / Full Text
  • City: Puerto de la Cruz, Tenerife
  • Country: Spain
  • Page Numbers: pp.227-231
  • Keywords: Crystalline structure, Deposition temperature, FESEM, Reflectance, Sol-gel, ZnO
  • Anadolu University Affiliated: Yes


Zinc oxide (ZnO) films were deposited on p-Si substrates by sol-gel spin coating method. Zinc acetate dihydrate (ZnAc), 2-methoxyethanol and monoethanolamine (MEA) were used as a starting material, solvent and stabilizer, respectively. The films were deposited 500°C, 600°C, 700°C and 800°C for 1 h in air. The effects of deposition temperature on the crystallinity and morphological properties of ZnO films were assessed by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM). The important changes in crystalline structure of the films were observed due to the deposition temperature. The crystallite size, texture coefficient and lattice constant of the films have been calculated. The FESEM measurements showed that the number of particles which has hexagonal structure increased with increasing deposition temperature.