Optimization of α-sialon microstructure by heat treatment


Key Engineering Materials, vol.368-372 PART 1, pp.891-893, 2008 (Scopus) identifier

  • Publication Type: Article / Abstract
  • Volume: 368-372 PART 1
  • Publication Date: 2008
  • Doi Number: 10.4028/0-87849-473-1.891
  • Journal Name: Key Engineering Materials
  • Journal Indexes: Scopus
  • Page Numbers: pp.891-893
  • Keywords: Heat treatment, Image analyze, LSW theory, SiAlON
  • Anadolu University Affiliated: Yes


Nd-doped α-SiAlON starting composition (Nd0.33Si 9.38Al2.62O1.62N14.38) was prepared by gas pressure sintering at 1825°C for 3 hrs. In order to explore the effect of post heat treatment on the developments of elongated α-SiAlON grains, sample was heat treated at 1800°C for 4-12 hrs. It was found that post heat treatments promoted formation of the elongated α-SiAlON grains. The controlling mechanism of grain growth was determined via plotting on a graph the growth in width/length versus time graphics using Image Analysis method. Different growth rates were found between the length and width direction of the α-SiAlON crystals, resulting in anisotropic grain growth in the microstructural development.